To meet the growing demand for high-precision temperature monitoring in semiconductor and photovoltaic production, our company has launched a series of high-performance profile thermocouples for furnace internal temperature testing.
This series is divided into two types for diffusion furnaces and oxidation furnaces, with S/R, K/N graduation types available. With a maximum measuring range up to 1100°C and diverse measuring points from 3 to 9, it realizes full-coverage temperature detection of silicon wafers. Adopting premium quartz and stainless steel materials, the thermocouple boasts low measurement error, fast thermal response and long service life. Meanwhile, the product is optimized for low-pollution performance, which will not affect the wafer production process.
Flexible assembly and personalized customization of probe length, diameter and installation mode make it widely applicable to diffusion furnaces, oxidation furnaces, annealing furnaces and other core production equipment. Our profile thermocouple provides stable and accurate thermal profile data, helping enterprises improve process efficiency and product yield.
We will keep optimizing temperature sensing solutions to support the high-quality development of the global semiconductor and PV industries.