Semiconductor Profile Thermocouple

The oxidation diffusion furnace is a key process equipment for the production of PV cells. It mixes and diffuses trace amounts of boron, phosphorus and other elements on the silicon wafer at high temperatures to prepare P-N junctions and composes integrated circuits from it. It can also be used to preparing SiOx films on the surface of the silicon wafer to protect wafers.It is common to use thermocouples measuring both the inner and outer parts of the furnace to control the inner temperature of the diffusion furnace that could perform the oxidation process. Each specified temperature zone has an outer and inner thermocouple to make sure the measure results are reliable. The Multipoint Noble Metal Quartz Thermocouples are used to measure wafer temperature, it commonly has 3~9 measure points, representing the wafer temperature accurately.

To this end, Duchin have developed proprietary techniques and products such as Multipoint Noble Metal Quartz Thermocouple for temperature measurement of the entire section in the diffusion furnace, a calibration device for multi-point thermocouple.

The product has some traits of reliable temperature measurement, high accuracy, good stability, fast thermal response, anti-interference, high and low-temperature impact resistance, long service life, and so on. The technical parameters of the Semiconductor Profile Thermocouple are as follows:

Manual Welding

Automatic Welding

Insulation Testing

Laser Marking

Warehouse Managing

Thermocouple Assemble

Vacuum Leak Detection

Surface Polishing

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